Estudo do comportamento cinético de oxidação do ácido mandélico por Estudo do comportamento cinético de oxidação do ácido mandélico por vanádio(V) em meio de ácido sulfúrico: efeito da presença de CTAB

Eduardo Niehues; Rômulo Augusto Ando; Keiko Takashima

doi:10.5433/1679-0375.2006v27n2p183

Study of the kinetic behavior of mandelic acid oxidation by vanadium(V) in sulfuric acid medium: effect of CTAB presence

Authors

Eduardo Niehues Universidade Estadual de Londrina
Rômulo Augusto Ando Universidade Estadual de Londrina
Keiko Takashima Universidade Estadual de Londrina

DOI:

https://doi.org/10.5433/1679-0375.2006v27n2p183

Keywords:

Mandelic acid, á-hydroxyacid, Oxidation by vanadium (V).

Abstract

The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V)The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V).

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Author Biographies

Eduardo Niehues, Universidade Estadual de Londrina

Bolsista de Iniciação Científica PIBIC/CNPq.

Rômulo Augusto Ando, Universidade Estadual de Londrina

Bolsista de Iniciação Científica PIBIC/CNPq.

Keiko Takashima, Universidade Estadual de Londrina

Departamento de Química/CCE/UEL.

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Published

2006-12-15

How to Cite

Niehues, E., Ando, R. A., & Takashima, K. (2006). Study of the kinetic behavior of mandelic acid oxidation by vanadium(V) in sulfuric acid medium: effect of CTAB presence. Semina: Ciências Exatas E Tecnológicas, 27(2), 183–191. https://doi.org/10.5433/1679-0375.2006v27n2p183

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Issue

Vol. 27 No. 2 (2006)

Section

Original Article

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