NIEHUES, E.; ANDO, R. A.; TAKASHIMA, K. Study of the kinetic behavior of mandelic acid oxidation by vanadium(V) in sulfuric acid medium: effect of CTAB presence. Semina: Ciências Exatas e Tecnológicas, [S. l.], v. 27, n. 2, p. 183–191, 2006. DOI: 10.5433/1679-0375.2006v27n2p183. Disponível em: https://ojs.uel.br/revistas/uel/index.php/semexatas/article/view/1877. Acesso em: 30 apr. 2024.